Implanted medical devices cause over a million infections per year, posing both an enormous burden on the healthcare system and serious risk to the health of the patient. These infections frequently cause the device to lose its function, requiring risky excision and replacement. To combat infection, metal coatings are typically applied to the device surface which have potent bactericidal properties, but eventually decay and release toxic and carcinogenic metal ion deposits within the body.
Description
The BioBulwark is a bactericidal and biofilm-eliminating coating that can be applied to polypropylene mesh implants. Devices with BioBulwark are coated with vertically oriented graphene that slices open biofilms and bacterial cell membranes. Graphene is first applied vertically to the device surface using a technique called Plasma Enhanced Chemical Vapor Deposition (PECVD). The device surface is then coated with 60-100 nm “spikes” that are sharp enough to pierce bacterial cell membranes and biofilms while keeping larger human cells intact. The stability of vertically oriented graphene makes it impervious to decay and its bactericidal properties are well-documented in the literature, setting it apart from the competition. Research also indicates that bacterial cells exhibit no signs of developing resistance to the coating and that the coating does not damage human host cells. BioBulwark will save the healthcare system billions while awarding patients a peace of mind and the reliable implants that they deserve.
Applications
· Urogynecologic and hernia mesh implants
· Dialysis catheters
· Cardiac implants, including LVAD and prosthetic heart valves
Advantages
· Vertically-oriented graphene is stable and impervious to decay
· Well-documented bactericidal properties
· Mechanical destruction of bacterial membrane prevents the development of bacterial resistance, as seen with antibiotic treatment
· Poses no threat to human cells
· Specifically prevents biofilm formation
· Malleable and non-toxic
Invention Readiness
Concept
IP Status
https://patents.google.com/patent/US20230397978A1
