University of Pittsburgh

Using Protective Film to Synthesize Arbitrarily Structured Graphitic Material from Organic Material

This advanced technology leverages DNA nanostructures as templates to fabricate graphitic carbon materials with precision. The process begins by coating DNA with a thin aluminum oxide layer via atomic layer deposition that acts as a protective barrier during high-temperature carbonization at 780°C to 1000°C in a low-pressure hydrogen or inert atmosphere. This treatment converts the DNA framework into structured carbon while maintaining its intricate morphology. After carbonization, an etching process removes the protective layer, unveiling a material with customizable properties such as enhanced strength, tailored porosity, and improved conductivity, as confirmed through techniques like AFM, Raman spectroscopy, and UV/Ozone treatment.

Description

This approach stands apart by integrating DNA nanotechnology with high-temperature processing, overcoming the thermal instability of biological templates. The innovative protective coating method preserves complex DNA geometries and enables carbonization that retains nanoscale details with a resolution down to 2 nanometers. Its precise control over material structure and rapid processing capabilities not only extend the potential for electronics, energy storage, and advanced material applications but also offer a marked improvement over conventional carbon fabrication techniques.

Applications

- Nanoelectronic device fabrication
- Battery electrode manufacturing
- Supercapacitor production processes
- Precision nanocomposite integration

Advantages

- Enables precise control over graphitic material structure by leveraging intricately designed DNA templates.
- Utilizes an innovative Al2O3 protective coating to safeguard DNA during high-temperature carbonization, preserving nanoscale morphology.
- Allows tailoring of material properties such as strength, porosity, and conductivity through customizable DNA configurations.
- Extends DNA nanotechnology into high-temperature processing applications, opening new avenues in electronics and energy storage.
- Achieves exceptional resolution (down to 2 nanometers) and rapid carbonization, enhancing overall fabrication efficiency.

IP Status

https://patents.google.com/patent/US11739421B2